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  • Most Cited Patent Families 1999-Chemistry and Related Science
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Home   •   Spotlight  •  pcite99  •  Most Cited Patent Families 1999-Chemistry and Related (7)
Most Cited Patent Families 1999-Chemistry and Related

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Following is a CAS database record representing a highly cited patent family.



CAS subject entries for this document include: Silicophosphates .

CAPLUS COPYRIGHT 2001 ACS

TITLE: Crystalline silicoaluminophosphates
INVENTOR(S):
PATENT ASSIGNEE(S): Union Carbide Corp., USA
SOURCE: Jpn. Kokai Tokkyo Koho, 57 pp. CODEN: JKXXAF
LANGUAGE: Japanese
PATENT INFORMATION:
PATENT NO.       KIND  DATE           APPLICATION NO.  DATE
---------------  ----  --------       ---------------  --------
JP 59035018       A2   19840225       JP 1983-134542   19830725
JP 03072010       B4   19911115
US 4440871        A    19840403       US 1982-400438   19820726
DK 8303398        A    19840127       DK 1983-3398     19830725
NO 8302712        A    19840127       NO 1983-2712     19830725
NO 169380         B    19920309NO 169380         C    19920701
EP 103117         A1   19840321       EP 1983-107267   19830725
EP 103117         B1   19860917    R:  AT, BE, CH, DE, FR, GB, IT, LI, NL, SE
AT 22272          E    19861015       AT 1983-107267   19830725
ES 524429         A1   19850401       ES 1983-524429   19830726
CA 1202016        A1   19860318       CA 1983-433213   19830726
ES 531010         A1   19851101       ES 1984-531010   19840327
ES 531009         A1   19860216       ES 1984-531009   19840327
US 5114563        A    19920519       US 1990-618761   19901127

ABSTRACT:
The cryst. silicoaluminophosphates have uniform pores (>3 .ANG.) and empirical formula (anhyd. base) mR:(SixAlyPz)O2, where R = .gtoreq.1 org. templating agents in pores; m = 0.02-0.3; x, y, and z = mol fraction of Si, Al, and P, resp. They are used as adsorbents and catalysts. Thus, H3PO4, H2O, hydrated Al2O3, HCl, fused SiO2, and Et4NOH were mixed, heated in pressure vessel at 150.degree. for 168 h, filtered, H2O-washed, and dried to obtain a product with empirical formula (anhyd. base) 0.053 Et4N: (Si0.2Al0.41P0.39)O2.

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Updated 4/20/2007 9:16:29 AM
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